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Structural and magnetic properties of Fe/Si and Fe/FeSi multilayers

✍ Scribed by I. Sakamoto; S. Honda; H. Tanoue; M. Koike; S. Purwanto


Book ID
108184143
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
124 KB
Volume
290-291
Category
Article
ISSN
0304-8853

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Interface studies in metal/semiconductor systems are important due to their potential technological application in microelectronics. A total of 80 nm Fe film was deposited on Si(111) substrate using electron beam evaporation technique at a vacuum of 2 Γ‚ 10 Γ€7 Torr. The samples were annealed at tempe