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Structural and electrical properties of Ta2O5 thin films deposited on Si(1 0 0) from Ta(OC2H5)5 precursor

✍ Scribed by Florence Jolly; Maurizio Passacantando; Vicenzo Salerni; Luca Lozzi; Pietro Picozzi; Sandro Santucci

No coin nor oath required. For personal study only.

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Structural and electrical properties of Ta2O5 thin films deposited on Si(1&#xa0;0&#xa0;0) from Ta(OC2H5)5 precursor