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Structural and electrical properties of 28Si+ and 40Ar+ ion implanted epitaxial ReSi2 films grown on n-Si(100) substrates

✍ Scribed by Kun Ho Kim; Sung Chul Kim; Jeong Yong Lee; Sang Tack Nam; Jeoung Ju Lee; Chi Kyu Choi; Marc-A. Nicolet; Gang Bai

No coin nor oath required. For personal study only.

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