Strongly asymmetric doping profiles at mask edges in high-energy ion implantation

✍ Scribed by Wijburg, R.C.; Hemink, G.J.; Middelhoek, J.

• Book ID: 114536243
• Publisher: IEEE
• Year: 1990
• Tongue: English
• Weight: 966 KB
• Volume: 37
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.43803