Multilayer thin films/substrate system w
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D. Ngo; X. Feng; Y. Huang; A.J. Rosakis
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Article
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2008
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Elsevier Science
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English
โ 279 KB
Current methodologies used to infer thin-film stress from curvature measurements are strictly restricted to stress and curvature states that are assumed to remain uniform over the entire film/substrate system. These methodologies have recently been extended to a single thin film of non-uniform thick