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Stress in a-Si1−xCx:H studied by (n, −n) double crystal diffractometry

✍ Scribed by Zhouyao Zhang; Mingwei Qi; Jingyi Chen; Ruguang Cheng

Book ID: 115987093
Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 158 KB
Volume: 114
Category: Article
ISSN: 0022-3093
DOI: 10.1016/0022-3093(89)90633-9

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