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Optical contrast formation in a-Si1−xCx:H films by ion implantation

✍ Scribed by T. Tsvetkova; N. Tzenov; M. Tzolov; D. Dimova-Malinovska; G. Adriaenssens; H. Pattyn; W. Lauwerens

No coin nor oath required. For personal study only.

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