Stress-engineered spatially selective self-assembly of strained InAs quantum dots on nonplanar patterned GaAs(001) substrates
β Scribed by Konkar, A.; Madhukar, A.; Chen, P.
- Book ID
- 121830602
- Publisher
- American Institute of Physics
- Year
- 1998
- Tongue
- English
- Weight
- 502 KB
- Volume
- 72
- Category
- Article
- ISSN
- 0003-6951
- DOI
- 10.1063/1.120691
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We report a comparative study on selective epitaxy of nanostructures with different geometrical shapes. GaAs pyramids were grown by molecular beam epitaxy into circular holes, L-shaped holes, and cross-shaped holes, patterned using nanoimprint lithography. These GaAs nanostructures were used for gui
A site-selective growth of self-organized InAs quantum dots (QDs) employing a combination of in-situ focused ion beam (FIB) implantation and self-organized molecular beam epitaxy (MBE) growth has been successfully demonstrated. First, a buffer layer of GaAs was grown by MBE before a square lattice o