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Strain behavior of epitaxial Si1−xCx films on silicon substrates during dry oxidation

✍ Scribed by Kim, S.-W.; Yoo, J.-H.; Koo, S.-M.; Lee, H.-J.; Ko, D.-H.

Book ID: 123203342
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 990 KB
Volume: 546
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2013.05.131

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