๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Stability of anodic tantalum oxide films in NaOH solutions

โœ Scribed by A. G. Gad Allah; W. A. Badawy; H. H. Rehan


Publisher
Springer
Year
1989
Tongue
English
Weight
557 KB
Volume
19
Category
Article
ISSN
0021-891X

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Anodic oxidation of tellurium in NaOH so
โœ S.A. Awad ๐Ÿ“‚ Article ๐Ÿ“… 1962 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 448 KB

The potential of tellurium anodes has been measured as a function of current density in 0.01-3 N NaOH at 30ยฐC. The results indicate the oxidation of tellurium into tellurous acid. The initial discharge of hydroxyl ions governs the overall reaction rate within the concentration range 0.01-l N. In con

The formation of anodic oxide films on t
โœ D.A Vermilyea ๐Ÿ“‚ Article ๐Ÿ“… 1954 ๐Ÿ› Elsevier Science โš– 560 KB

The anodic films formed on tantalum in many non-aqueous solutions have been found to consist of two layers. Next to the metal there is a layer of Ta206 with the same characteristics as that of films formed in aqueous electrolytes, while between the TaeOb film and the solution there is a layer which