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Sputtered magnesium diboride thin films: Growth conditions and surface morphology

✍ Scribed by April O’Brien; Brendon Villegas; J.Y. Gu

Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 291 KB
Volume: 469
Category: Article
ISSN: 0921-4534
DOI: 10.1016/j.physc.2008.10.006

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## Abstract ZnO thin films doped with Li (ZnO:Li) were deposited onto SiO~2~/Si (100) substrates by direct‐current sputtering technique in the temperature range from room temperature to 500 °C. The crystalline structure, surface morphology and composition, and optical reflectivity of the deposited