Sputter yield amplification by tungsten doping of Al 2 O 3 employing reactive serial co-sputtering: process characteristics and resulting film properties

✍ Scribed by Austgen, M; Koehl, D; Zalden, P; Kubart, T; Nyberg, T; Pflug, A; Siemers, M; Berg, S; Wuttig, M

• Book ID: 121447324
• Publisher: Institute of Physics
• Year: 2011
• Tongue: English
• Weight: 747 KB
• Volume: 44
• Category: Article
• ISSN: 0022-3727
• DOI: 10.1088/0022-3727/44/34/345501