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Characteristics of Er-doped Al/sub 2/O/sub 3/ thin films deposited by reactive co-sputtering

✍ Scribed by Musa, S.; van Weerden, H.J.; Yau, T.H.; Lambeck, P.V.

Book ID: 117869698
Publisher: IEEE
Year: 2000
Tongue: English
Weight: 270 KB
Volume: 36
Category: Article
ISSN: 0018-9197
DOI: 10.1109/3.863962

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