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Sputter depth profiling by secondary ion mass spectrometry coupled with sample current measurements

โœ Scribed by U. Bardi; S.P. Chenakin; A. Lavacchi; C. Pagura; A. Tolstogouzov


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
613 KB
Volume
252
Category
Article
ISSN
0169-4332

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๐Ÿ“œ SIMILAR VOLUMES


Depth profile measurement by secondary i
โœ M. Moens; M. van Craen; F.C. Adams ๐Ÿ“‚ Article ๐Ÿ“… 1984 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 1022 KB

The possibilities of measuring depth profiles by secondary ion mass spectrometry are evaluated. The influence of different instrumental and experimental parameters on depth resolution in the profiles are studied: the effects of primary ion beam characteristics, reactive gas adsorption and mechanical