SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Simulation and correction of resist charging due to fogging in electron-beam lithography

✍ Scribed by Babin, Sergey; Borisov, Sergey; Militsin, Vladimir; Patyukova, Elena; Faure, Thomas B.; Ackmann, Paul W.

• Book ID: 121696501
• Publisher: SPIE
• Year: 2013
• Weight: 695 KB
• Volume: 8880
• Category: Article
• DOI: 10.1117/12.2032177