SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Impact of proximity model inaccuracy on patterning in electron beam lithography

✍ Scribed by Chen, Cheng-Hung; Chien, Tsung-Chih; Liu, P. Y.; Wang, W. C.; Shin, J. J.; Lin, S. J.; Lin, Burn J.; Faure, Thomas B.; Ackmann, Paul W.

• Book ID: 121330001
• Publisher: SPIE
• Year: 2013
• Weight: 455 KB
• Volume: 8880
• Category: Article
• DOI: 10.1117/12.2029180