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SPIE Proceedings [SPIE SPIE Optics + Optoelectronics - Prague, Czech Republic (Monday 18 April 2011)] Damage to VUV, EUV, and X-ray Optics III - Frenkel defect process in amorphous silica

✍ Scribed by Kajihara, Koichi; Hirano, Masahiro; Skuja, Linards; Hosono, Hideo; Juha, Libor; Bajt, Saša; London, Richard A.

Book ID: 120233582
Publisher: SPIE
Year: 2011
Weight: 286 KB
Volume: 8077
Category: Article
DOI: 10.1117/12.886698

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