SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - High-NA high-throughput scanner compatible 2-kHz KrF excimer laser for DUV lithography

✍ Scribed by Nakarai, Hiroaki; Hisanaga, Naoto; Suzuki, Natsushi; Matsunaga, Takeshi; Asayama, Takeshi; Akita, Jun; Igarashi, Toru; Ariga, Tatsuya; Bushida, Satoru; Enami, Tatsuo; Nodomi, Ryoichi; Takabayashi, Yuichi; Sakanishi, Syouich; Suzuki, Takashi; Tomaru, Hitoshi; Nakao, Kiyoharu; Progler, Christopher J.

• Book ID: 120474335
• Publisher: SPIE
• Year: 2000
• Weight: 545 KB
• Volume: 4000
• Category: Article
• DOI: 10.1117/12.388987