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SPIE Proceedings [SPIE 14th Annual BACUS Symposium on Photomask Technology and Management - Santa Clara, CA (Wednesday 14 September 1994)] 14th Annual BACUS Symposium on Photomask Technology and Management - Importance of mask technical specifications on the lithography error budget

✍ Scribed by Escher, Gary C.; Brodsky, William L.; Shelden, Gilbert V.

No coin nor oath required. For personal study only.

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