SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - System architecture choices for an advanced mask writer (100 to 130 nm)

✍ Scribed by Chakarian, Varoujan; Raymond III, Frederick; Sauer, Charles A.; Babin, Sergey V.; Innes, Robert; Sagle, Allan L.; Hofmann, Ulrich; Shamoun, Bassam; Trost, David; Ghanbari, Abe; Abboud, Frank E.; Abboud, Frank E.; Grenon, Brian J.

• Book ID: 118171518
• Publisher: SPIE
• Year: 1999
• Weight: 861 KB
• Volume: 3873
• Category: Article
• DOI: 10.1117/12.373318