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Spectral investigation of polymerization processes during the plasma etching of silicon films

✍ Scribed by M. N. Bosyakov; A. A. Zaikov; A. A. Labuda


Publisher
Springer US
Year
1981
Tongue
English
Weight
264 KB
Volume
35
Category
Article
ISSN
0021-9037

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## Abstract The transient surface temperature and optical transmissivity profiles during the plasma annealing of amorphous silicon (a‐Si) on quartz substrate was studied using a radio‐frequency (rf) thermal plasma torch (TPT). The film crystallization promoted through solid‐phase crystallization (S