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Sources of Error in Total Reflection X-Ray Fluorescence Analysis and Error Correction Using the Internal Standard Method

✍ Scribed by G. V. Pavlinskii; A. N. Smagunova; O. M. Karpukova; O. Bolormaa; D. Dorzh

Book ID
110328830
Publisher
SP MAIK Nauka/Interperiodica
Year
2002
Tongue
English
Weight
73 KB
Volume
57
Category
Article
ISSN
1061-9348

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This paper reviews and discusses the error factors in quantitative total reflection x-ray fluorescence analysis, primarily with regard to the surface contamination of silicon wafers. The error factors were classified into three origins: instrumental, sample and data processing. The instrumental erro