Some chemical aspects of the fluorocarbon plasma etching of silicon and its compounds : J. W. Coburn and Eric Kay. IBM J. Res. Dev.23, (1) 33 (January 1979)

• Book ID: 103280071
• Publisher: Elsevier Science
• Year: 1979
• Tongue: English
• Weight: 128 KB
• Volume: 19
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(79)90463-3