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Solution-processed oxide thin-film transistors using aluminum and nitrate precursors for low-temperature annealing

✍ Scribed by Woong Hee Jeong; Jung Hyeon Bae; Kyung Min Kim; Dong Lim Kim; You Seung Rim; Si Joon Kim; Kyung-Bae Park; Jong-Baek Seon; Myung-Kwan Ryu; Hyun Jae Kim

Book ID: 117970417
Publisher: Society for Information Display
Year: 2011
Tongue: English
Weight: 561 KB
Volume: 19
Category: Article
ISSN: 1071-0922
DOI: 10.1889/jsid19.9.620

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