✦ LIBER ✦

Solubility of carbon dioxide in polyethylene/titanium dioxide composite under high pressure and temperature

✍ Scribed by Surat Areerat; Yusuke Hayata; Ryuichi Katsumoto; Tadahiro Kegasawa; Hideo Egami; Masahiro Ohshima

Publisher: John Wiley and Sons
Year: 2002
Tongue: English
Weight: 206 KB
Volume: 86
Category: Article
ISSN: 0021-8995
DOI: 10.1002/app.10944

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Effect of high pressure carbon dioxide o

Effect of high pressure carbon dioxide on the solubility and diffusivity of dichloromethane in polyetherimide

✍ Yuk Yu Law; Ida M. Balashova; Ronald P. Danner 📂 Article 📅 2009 🏛 John Wiley and Sons 🌐 English ⚖ 224 KB 👁 2 views

High-pressure viscosity of polystyrene s

High-pressure viscosity of polystyrene solutions in toluene + carbon dioxide binary mixtures

✍ Sang-Do Yeo; Erdogan Kiran 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 225 KB 👁 2 views

High-pressure viscosity of polystyrene (M w ϭ 50,000, M w /M n Յ 1.06) solutions in toluene and in mixtures of toluene ϩ carbon dioxide was measured using a falling cylinder-type viscometer at 320, 340, and 360 K, and up to 35 MPa. Solutions with polystyrene concentrations of 3, 5, and 7 wt % were i

Phase behavior and density of polysulfon

Phase behavior and density of polysulfone in binary fluid mixtures of tetrahydrofuran and carbon dioxide under high pressure: Miscibility windows

✍ Wei Zhang; Erdogan Kiran 📂 Article 📅 2002 🏛 John Wiley and Sons 🌐 English ⚖ 206 KB 👁 2 views

High-temperature Synthesis of Amino Acid

High-temperature Synthesis of Amino Acids in the System Acetylene/Ammonia/Carbon Dioxide

✍ Dr. K. Samochocka; Mgr. A. L. Kawczynski; Doc. Dr. M. Taube 📂 Article 📅 1968 🏛 John Wiley and Sons 🌐 English ⚖ 101 KB 👁 1 views

Chemical vapour deposition of the oxides

Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of hafnium dioxide

✍ Ryan C. Smith; Tiezhong Ma; Noel Hoilien; Lancy Y. Tsung; Malcolm J. Bevan; Luig 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 340 KB 👁 1 views

A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standar