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Solid state characteristics of indium-incorporated TiO2 thin films

โœ Scribed by Badawy, W. A. ;Momtaz, R. S. ;Elgiar, E. M.

Book ID
105381887
Publisher
John Wiley and Sons
Year
1990
Tongue
English
Weight
289 KB
Volume
118
Category
Article
ISSN
0031-8965

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Thin, solid films of a CuC1:CuBr:Cul mixed phase are formed on copper substrates by an electrolytic deposition technique. The films are incorporated in solid-state cells with the configuration Mg/CuCl:CuBr:CuI/Cu. A typical cell gives an open-circuit voltage of -1.3 V, a short-circuit current of -10