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Discharge characteristics of solid-state cells incorporating thin films of a cuprous halide mixed phase

โœ Scribed by M.A.K.L. Dissanayake; J. Karunamuni


Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
219 KB
Volume
24
Category
Article
ISSN
0378-7753

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โœฆ Synopsis


Thin, solid films of a CuC1:CuBr:Cul mixed phase are formed on copper substrates by an electrolytic deposition technique. The films are incorporated in solid-state cells with the configuration Mg/CuCl:CuBr:CuI/Cu. A typical cell gives an open-circuit voltage of -1.3 V, a short-circuit current of -10 mA, and a capacity of -5 mA h.


๐Ÿ“œ SIMILAR VOLUMES


Discharge characteristics of solid-state
โœ M.A.K.L. Dissanayake; J. Karunamuni; H.M.N. Bandara ๐Ÿ“‚ Article ๐Ÿ“… 1988 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 184 KB

Thin, solid films of cuprous sulphate have been formed on copper substrates by a chemical deposition technique. Solid-state cells of configuration Mg(-)/C&SO&u(+) have been fabricated and their constant-load discharge characteristics have been investigated. A typical cell exhibits an open-circuit vo