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Solid-phase epitaxial growth of CoSi2 on clean and oxygen-adsorbed Si(001) surfaces

โœ Scribed by Yukihiro Hayashi; Motoki Yoshinaga; Hiroya Ikeda; Shigeaki Zaima; Yukio Yasuda


Book ID
117219731
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
382 KB
Volume
438
Category
Article
ISSN
0039-6028

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๐Ÿ“œ SIMILAR VOLUMES


Epitaxial CoSi2 by solid phase reaction
โœ M. Falke; B. Gebhardt; G. Beddies; S. Teichert; H.-J. Hinneberg ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 410 KB

TEM and RBS studies of the solid phase reaction of Co / Ti-and Co / Hf / Si(001) layer systems are reported. In addition to conventional annealing procedures a special thermal treatment was applied to investigate the intermediate stages of the reaction during heating up. With rising temperature a co