A new laser transfer process is reported which allows damage-free transfer of ferroelectric thin films from a growth substrate directly to a target substrate. The thin film ferroelectric material is deposited on a fused silica growth substrate with a sacrificial release layer of ITO (indium tin oxid
β¦ LIBER β¦
Sol-gel formation of ITO thin film from a sol including ITO powder
β Scribed by Motoyuki Toki; Mamoru Aizawa
- Publisher
- Springer
- Year
- 1997
- Tongue
- English
- Weight
- 294 KB
- Volume
- 8
- Category
- Article
- ISSN
- 0928-0707
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