We report here the synthesis of silicon-nanoclusters embedded in SiO 2 by atom beam co-sputtering technique. A sputtering target consisted of 40% and 60% area of Si pieces glued on a fused silica plate. A cosputtered film containing Si embedded in SiO 2 having different compositional fractions of Si
โฆ LIBER โฆ
Size control of Si nanocrystals by two-step rapid thermal annealing of sputtered Si-rich oxide/SiO2superlattice
โ Scribed by Samson T. H. Silalahi; Q. V. Vu; H. Y. Yang; K. Pita; Yu Mingbin
- Publisher
- Springer
- Year
- 2010
- Tongue
- English
- Weight
- 765 KB
- Volume
- 98
- Category
- Article
- ISSN
- 1432-0630
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