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SiOx(C)/SiNx dual-layer anti-reflectance film coating for improved cell efficiency

โœ Scribed by Chunlan Zhou; Tao Li; Yang Song; Su Zhou; Wenjing Wang; Lei Zhao; Hailing Li; Yehua Tang; Hongwei Diao; Zhihua Gao; Ye Duan; Youzhong Li

Book ID
113912556
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
588 KB
Volume
85
Category
Article
ISSN
0038-092X

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โœ A. Okada; R. Sasaki; Y. Matsumoto; M. Takeisi; T. Saito; K. Toh; N. Usami; T. Su ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› Elsevier ๐ŸŒ English โš– 610 KB

AZO (Al: 2 wt %) films were deposited at 300 หšC on fused silica substrates by the radio-frequency magnetron sputtering method under different sputtering pressures and at various sample positions in order to obtain the optimum sputtering condition for low-resistivity AZO films. It was found that the