We have fabricated silicon quantum dot devices based on a dual gate technique. Two lateral gates deplete the inversion layer which is induced by a top gate, thus forming a quantum dot located between the source and drain of a long channel MOSFET. Lithographic dimensions of the dots ranged from 40 nm
✦ LIBER ✦
Single-electron quantum dots in silicon MOS structures
✍ Scribed by M. Khoury; A. Gunther; S. Miličić; J. Rack; S.M. Goodnick; D. Vasileska; T.J. Thornton; D.K. Ferry
- Publisher
- Springer
- Year
- 2000
- Tongue
- English
- Weight
- 238 KB
- Volume
- 71
- Category
- Article
- ISSN
- 1432-0630
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