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Single atomic steps on SiC polished surfaces

✍ Scribed by P. Vicente; D. Chaussende


Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
201 KB
Volume
15
Category
Article
ISSN
0961-1290

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✦ Synopsis


On-axis 4H-SiC and 6H-SiC are very promismismatch between GaN and Sic combined D. Chaussende ing material for respectively electronics with a high thermal conductivity makes 6H-NOVASiC, Savoie Technolac, and optoelectronics applications. Compared SK a good substrate for the growth of Group BP267,73375 Le Bourget du to GaN and sapphire, the reduced lattice Ill-nitride epitaxial layers [l]. Lac Cddex (France).


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