𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Simulation of 3D inclined/rotated UV lithography and its application to microneedles

✍ Scribed by Shijie Liu; Georg Roeder; Gulnur Aygun; Kristian Motzek; Peter Evanschitzky; Andreas Erdmann

Book ID
113650960
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
545 KB
Volume
123
Category
Article
ISSN
0030-4026

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Numerical simulation of 3-D seepage fiel
Numerical simulation of 3-D seepage field in tailing pond and its practical application
✍ Li-ting Zhang; Qing-lan Qi; Bao-lin Xiong; Jun Zhang πŸ“‚ Article πŸ“… 2011 πŸ› Elsevier 🌐 English βš– 475 KB

The new generalized method of numerical model of three-dimensional seepage field in tailing pond is provided. According to actual terrain, the major control points of the cross section are made to the curve, and then make curve to synthetic curved surface. Three-dimensional numerical model is a spac