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Simple improvement of the Lindner high-frequency MOS capacitance approximation

✍ Scribed by Fenske, F.


Publisher
John Wiley and Sons
Year
1983
Tongue
English
Weight
189 KB
Volume
75
Category
Article
ISSN
0031-8965

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Improvement of oxide thickness determina
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It is well known that capacitance-voltage (C2V) measurements provide a simple determination of oxide thickness, but with the scaling down of components the classical method is not appropriated any more. We have observed that for two devices with the same oxide thickness and different surfaces, the c