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‘SIMOX’ (Separation by Ion Implantation of Oxygen): a Technology for high-temperature silicon sensors

✍ Scribed by B. Diem; R. Truche; S. Viollet-Bosson; G. Delapierre

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

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Features of buried dielectric layers: io

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A technique for positron spectroscopy of

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