Silicon oxide/silicon nitride dual-layer films: a stacked gate dielectric for the 21st century

✍ Scribed by Gerald Lucovsky

• Book ID: 117149975
• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 435 KB
• Volume: 254
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/s0022-3093(99)00432-9