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Silicon field emission arrays coated with CNxthin films

โœ Scribed by Chen Ming-an; Li Jin-chai; Liu Chuan-sheng; Ma You-peng; Lu Xian-feng; Ye Ming-sheng

Book ID
105648313
Publisher
Wuhan University
Year
2003
Tongue
English
Weight
942 KB
Volume
8
Category
Article
ISSN
1007-1202

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Fabrication of silicon field-emission ar
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โœ D.F. Takeuti; M.N. Tirolli; C.L. Danieli; M.A.R. Alves; E.S. Braga; P.H.L. de Fa ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 341 KB

A fabrication process of silicon field-emission arrays is reported, in which thin films of amorphous hydrogenated carbon (a-C:H) are employed as masks in a two-step plasma-etching process, using pure SF 6 and a mixture of SF 6 and O 2 . In comparison with processes that involve SiO 2 masks, the use