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Silicon etch process options for micro- and nanotechnology using inductively coupled plasmas

โœ Scribed by C.C. Welch; A.L. Goodyear; T. Wahlbrink; M.C. Lemme; T. Mollenhauer


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
455 KB
Volume
83
Category
Article
ISSN
0167-9317

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