The photopatternability of various silyl hydride containing organosilicone resins containing the photobase generators N-methylnifedipine or O-(2-nitrobenzyl)-Noctyl carbamate have been examined, with the goal of identifying potential photopatternable compositions with high thermal stability after cu
Silicon-containing heterocyclic polymers and thin films made therefrom
โ Scribed by Corneliu Hamciuc; Elena Hamciuc; Tadeusz Pakula; Lidia Okrasa
- Publisher
- John Wiley and Sons
- Year
- 2006
- Tongue
- English
- Weight
- 369 KB
- Volume
- 102
- Category
- Article
- ISSN
- 0021-8995
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