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Silicon carbide and oxide deposition using low energy (5–100 eV) beams of C+, O+, and CO+ ions

✍ Scribed by B.C. Kim; J.R. Hahn; H. Kang

Book ID: 113286807
Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 469 KB
Volume: 106
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(95)00692-3

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