Silicon based optical devices - photonic applications of anisotropically nanostructured silicon

✍ Scribed by Diener, J. ;Künzner, N. ;Gross, E. ;Kovalev, D. ;Fujii, M.

• Publisher: John Wiley and Sons
• Year: 2005
• Tongue: English
• Weight: 327 KB
• Volume: 202
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200461124

✦ Synopsis

Abstract

Anisotropic nanostructuring of bulk silicon (Si) wafers leads to a significant in‐plane optical anisotropy of single porous silicon (PSi) layers. Additionally a variation of the etching current in time allows a controlled modification of the porosity along the growth direction and therefore a three‐dimensional variation of the refractive index (in‐plane and in‐depth). This technique can be important for photonic applications since it is the basis of a development of a variety of novel, polarization‐sensitive, silicon‐based optical devices: retarders, dichroic Bragg reflectors, dichroic microcavities and planar Si‐based polarizers. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)