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Silicasulfuric Acid/NaNO3 as a New Reagent for the Deprotection of S,S-Acetals under Mild Conditions.

✍ Scribed by Abdol R. Hajipour; Amin Zarei; Leila Khazdooz; Arnold E. Ruoho

Publisher: John Wiley and Sons
Year: 2006
Weight: 31 KB
Volume: 37
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.200636054

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