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Silicasulfuric Acid/NaNO2 as a New Reagent for Deprotection of S,S-Acetals under Solvent-Free Conditions.

✍ Scribed by Abdol R. Hajipour; Amin Zarei; Leila Khazdooz; Seied Ali Pourmousavi; Arnold E. Ruoho

Publisher: John Wiley and Sons
Year: 2005
Weight: 22 KB
Volume: 36
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.200540070

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✦ Synopsis

Abstract

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