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Sign of the charge accumulated in thermal SiO2 films of silicon MIS structures under high electric field condition

โœ Scribed by Mikhailovskii, I. P. ;Potapov, P. B. ;Epov, A. E.


Publisher
John Wiley and Sons
Year
1986
Tongue
English
Weight
411 KB
Volume
94
Category
Article
ISSN
0031-8965

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