Si3N4–TiN based micro-laminates with rising R-curve behaviour

✍ Scribed by G. Blugan; R. Dobedoe; M. Lugovy; S. Koebel; J. Kuebler

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 353 KB
• Volume: 37
• Category: Article
• ISSN: 1359-8368
• DOI: 10.1016/j.compositesb.2006.02.013

✦ Synopsis

Two different Si 3 N 4 -TiN based micro-laminates were successfully designed and manufactured (by tape casting) with a rising R-curve behaviour. These laminates were successfully designed to have maximum apparent fracture toughnesses of 10.5 and 18.0 MPa m 1/2 . Thin compressive Si 3 N 4 layers of 50 mm thickness were used to control the residual stresses and hence the apparent fracture toughness in the microlaminates. No 'edge cracking', crack deflection or crack bifurcation was observed in the two designs of micro-laminates studied.