Silicon nitride is used in different applications because of its resistance against thermal shock, high temperature and mechanical load. An appropriate second phase like TiN could make Si 3 N 4 attractive for additional applications. This work deals with the introduction of a TiN phase from a nanosi
β¦ LIBER β¦
Diffusion bonding of Si3N4-TiN composite with nickel-based interlayers
β Scribed by F. Deschaux-Beaume; N. Frety; C. Colin
- Publisher
- The Minerals, Metals & Materials Society
- Year
- 2003
- Tongue
- English
- Weight
- 939 KB
- Volume
- 34
- Category
- Article
- ISSN
- 1073-5623
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