Plasma enhanced deposition of “silicon n
✦ LIBER ✦
Shallow ion implantation in gallium arsenide : J. D. Grange, D. C. Bartle, B. R. Brown, C. Dineen, K. S. Knight, J. D. Medland, D. K. Wickenden and M. G. Dowsett. Vacuum34 (1–2), 199 (1984)
- Publisher
- Elsevier Science
- Year
- 1984
- Tongue
- English
- Weight
- 136 KB
- Volume
- 24
- Category
- Article
- ISSN
- 0026-2714
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