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โœฆ   LIBER   โœฆ

๐Ÿ“

Semiconductor Materials and Process Technology Handbook

โœ Scribed by McGuire, G.E.(eds.)


Publisher
William Andrew Publishing/Noyes
Year
1988
Tongue
English
Leaves
326
Category
Library

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โœฆ Synopsis


This handbook is a broad review of semiconductor materials and process technology, with emphasis on very-large-scale integration (VLSI) and ultra-large-scale integration (ULSI). The technology of integrated circuit (IC) processing is expanding so rapidly that it can be difficult for the scientist working in one area to keep abreast of developments in other areas of the field. This handbook solves this problem by bringing together "snapshots" of the various aspects of the technology.

โœฆ Table of Contents



Content:
Front Matter
• Table of Contents
Introduction
1. Silicon Materials Technology
2. The Thermal Oxidation of Silicon and other Semiconductor Materials
3. Chemical Vapor Deposition of Silicon and its Compounds
4. Chemical Etching and Slice Cleanup of Silicon
5. Plasma Processing: Mechanisms and Applications
6. Physical Vapor Deposition
7. Diffusion and Ion Implantation in Silicon
8. Microlithography for VLSI
9. Metallization for VLSI Interconnect and Packaging
10. Characterization of Semiconductor Materials
Index


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