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Semiconductor Dendritic-Linear Block Copolymers by Nitroxide Mediated Radical Polymerization

✍ Scribed by Andreas S. Lang; Franz René Kogler; Michael Sommer; Ulrich Wiesner; Mukundan Thelakkat

Publisher
John Wiley and Sons
Year
2009
Tongue
English
Weight
205 KB
Volume
30
Category
Article
ISSN
1022-1336

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✦ Synopsis

Abstract

The first synthesis of a semiconductor hybrid diblock copolymer comprised of p‐type dendritic and n‐type linear blocks by nitroxide mediated radical polymerization (NMRP) is reported. A triphenylamine (TPA) bearing second generation polyether dendron [G2]‐OH has been functionalized with an alkoxyamine and, subsequently, perylene bisimide acrylate (PerAcr) was polymerized to obtain a hybrid block copolymer, [G2]‐b‐PPerAcr. The hybrid block copolymer structure is supported by ^1^H NMR and size exclusion chromatography. Furthermore, the novel materials were studied by UV‐vis absorption spectrometry, photoluminescence, cyclic voltammetry, differential scanning calorimetry and thermogravimetry analysis.

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